25 March 2016 Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes
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Abstract
Properties of new block copolymers systems, specifically designed to reach large periods for the features, are compared to the ones exhibited by classical PS-b-PMMA materials of same dimensions. Conducted studies, like free-surface defects analysis, mild-plasma tomography experiments, graphoepitaxy-guided structures, etch-transfer… indicate much better performances, in terms of achievable film-thicknesses with perpendicular features, defects levels, and dimensional uniformities, for the new system than for the classical PS-b-PMMA. These results clearly highlight unique and original solutions toward an early introduction of DSA technology into large lithographic nodes.
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X. Chevalier, P. Coupillaud, G. Lombard, C. Nicolet, J. Beausoleil, G. Fleury, M. Zelsmann, P. Bezard, G. Cunge, J. Berron, K. Sakavuyi, A. Gharbi, R. Tiron, G. Hadziioannou, C. Navarro, I. Cayrefourcq, "Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977913 (25 March 2016); doi: 10.1117/12.2219214; https://doi.org/10.1117/12.2219214
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