Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes

X. Chevalier; P. Coupillaud; G. Lombard; C. Nicolet; J. Beausoleil; G. Fleury; M. Zelsmann; P. Bezard; G. Cunge; J. Berron; K. Sakavuyi; A. Gharbi; R. Tiron; G. Hadziioannou; C. Navarro; I. Cayrefourcq

doi:10.1117/12.2219214

25 March 2016 Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes

X. Chevalier, P. Coupillaud, G. Lombard, C. Nicolet, J. Beausoleil, G. Fleury, M. Zelsmann, P. Bezard, G. Cunge, J. Berron, K. Sakavuyi, A. Gharbi, R. Tiron, G. Hadziioannou, C. Navarro, I. Cayrefourcq

Author Affiliations +

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 977913 (2016) https://doi.org/10.1117/12.2219214
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Properties of new block copolymers systems, specifically designed to reach large periods for the features, are compared to the ones exhibited by classical PS-b-PMMA materials of same dimensions. Conducted studies, like free-surface defects analysis, mild-plasma tomography experiments, graphoepitaxy-guided structures, etch-transfer… indicate much better performances, in terms of achievable film-thicknesses with perpendicular features, defects levels, and dimensional uniformities, for the new system than for the classical PS-b-PMMA. These results clearly highlight unique and original solutions toward an early introduction of DSA technology into large lithographic nodes.

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X. Chevalier, X. Chevalier, P. Coupillaud, P. Coupillaud, G. Lombard, G. Lombard, C. Nicolet, C. Nicolet, J. Beausoleil, J. Beausoleil, G. Fleury, G. Fleury, M. Zelsmann, M. Zelsmann, P. Bezard, P. Bezard, G. Cunge, G. Cunge, J. Berron, J. Berron, K. Sakavuyi, K. Sakavuyi, A. Gharbi, A. Gharbi, R. Tiron, R. Tiron, G. Hadziioannou, G. Hadziioannou, C. Navarro, C. Navarro, I. Cayrefourcq, I. Cayrefourcq, "Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977913 (25 March 2016); doi: 10.1117/12.2219214; https://doi.org/10.1117/12.2219214

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