25 March 2016 Directed self-assembly materials for high resolution beyond PS-b-PMMA
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Abstract
To extend directed self-assembly (DSA) of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) for higher resolution, placement accuracy and potentially improved pattern line edge roughness (LER), we have developed a next-generation material platform of organic high-χ block copolymers (“HC series”, AZEMBLYTM EXP PME-3000 series). The new material platform has a built-in orientation control mechanism which enables block copolymer domains to vertically selforient without topcoat/additive or delicate solvent vapor annealing. Furthermore, sub-10 nm lines and spaces (L/S) patterning by two major chemoepitaxy DSA, LiNe and SMARTTM processes, was successfully implemented on 12” wafer substrates by using the PME-3000 lamellar series. The results revealed that the new material platform is compatible with the existing PS-b-PMMA-based chemical prepatterns and standard protocols. We also introduced the built-in orientation control strategy to the conventional PS-b-PMMA system, producing a new generation of PS-b-PMMA materials with facile orientation control. The modified PS-b-PMMA (m-PS-b-PMMA) performed LiNe flow DSA yielding a comparable CD process window with improved LER/LWR/SWR after the L/S patterns were transferred into a Si substrate.
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Eri Hirahara, Eri Hirahara, Margareta Paunescu, Margareta Paunescu, Orest Polishchuk, Orest Polishchuk, EunJeong Jeong, EunJeong Jeong, Edward Ng, Edward Ng, Jianhui Shan, Jianhui Shan, Jian Yin, Jian Yin, Jihoon Kim, Jihoon Kim, Yi Cao, Yi Cao, Jin Li, Jin Li, SungEun Hong, SungEun Hong, Durairaj Baskaran, Durairaj Baskaran, Guanyang Lin, Guanyang Lin, } "Directed self-assembly materials for high resolution beyond PS-b-PMMA", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977914 (25 March 2016); doi: 10.1117/12.2220424; https://doi.org/10.1117/12.2220424
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