Influence of template fill in graphoepitaxy DSA

Jan Doise; Joost Bekaert; Boon Teik Chan; SungEun Hong; Guanyang Lin; Roel Gronheid

doi:10.1117/12.2219580

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25 March 2016 Influence of template fill in graphoepitaxy DSA

Jan Doise, Joost Bekaert, Boon Teik Chan, SungEun Hong, Guanyang Lin, Roel Gronheid

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Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 97791G (2016) https://doi.org/10.1117/12.2219580
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Directed self-assembly (DSA) of block copolymers (BCP) is considered a promising patterning approach for the 7 nm node and beyond. Specifically, a grapho-epitaxy process using a cylindrical phase BCP may offer an efficient solution for patterning randomly distributed contact holes with sub-resolution pitches, such as found in via and cut mask levels. In any grapho-epitaxy process, the pattern density impacts the template fill (local BCP thickness inside the template) and may cause defects due to respectively over- or underfilling of the template. In order to tackle this issue thoroughly, the parameters that determine template fill and the influence of template fill on the resulting pattern should be investigated. In this work, using three process flow variations (with different template surface energy), template fill is experimentally characterized as a function of pattern density and film thickness. The impact of these parameters on template fill is highly dependent on the process flow, and thus pre-pattern surface energy. Template fill has a considerable effect on the pattern transfer of the DSA contact holes into the underlying layer. Higher fill levels give rise to smaller contact holes and worse critical dimension uniformity. These results are important towards DSA-aware design and show that fill is a crucial parameter in grapho-epitaxy DSA.

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Jan Doise, Joost Bekaert, Boon Teik Chan, SungEun Hong, Guanyang Lin, and Roel Gronheid "Influence of template fill in graphoepitaxy DSA", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97791G (25 March 2016); https://doi.org/10.1117/12.2219580

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