25 March 2016 Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin
Author Affiliations +
Novolak resists have been widely used in IC production and are still used in the production of flat panel displays (FPDs) and MEMS. However, with the advent of high-definition products, FPDs increasingly face requirements for finer dimensions. These trends have generated requirements for higher sensitivity, higher resolution, and wider process margin for novolak resists. Using a lithography simulator with the goal of improving the performance of novolak resists, we examined various approaches to improving resist materials. This report discusses efforts to improve resolution and sensitivity using highly fractionated novolak resins and adding low molecular weight phenol resins.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Atsushi Sekiguchi, Atsushi Sekiguchi, Yoko Matsumoto, Yoko Matsumoto, Hatsuyuki Tanaka, Hatsuyuki Tanaka, Toshiyuki Horiuchi, Toshiyuki Horiuchi, Yoshihisa Sensu, Yoshihisa Sensu, Satoshi Takei, Satoshi Takei, Makoto Hanabata, Makoto Hanabata, "Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97791L (25 March 2016); doi: 10.1117/12.2218948; https://doi.org/10.1117/12.2218948

Back to Top