Spin-on-carbon hard masks utilising fullerene derivatives

Alan G. Brown; Andreas Frommhold; Tom Lada; J. Bowen; Z. el Otell; Alex P. G. Robinson

doi:10.1117/12.2219212

25 March 2016 Spin-on-carbon hard masks utilising fullerene derivatives

Alan G. Brown, Andreas Frommhold, Tom Lada, J. Bowen, Z. el Otell, Alex P. G. Robinson

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 977927 (2016) https://doi.org/10.1117/12.2219212
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

We have developed a range of fullerene containing materials for use as organic hard masks. Recent advances in material development are reported together with some results from external evaluations of the original HM100 series. Initial results for the new HM340-383-010 formulation show it to have a high thermal stability (~5.5 % mass loss at 400°C) and a very high carbon content (at 95.3%), offering high etch durability.

Citation Download Citation

Alan G. Brown, Andreas Frommhold, Tom Lada, J. Bowen, Z. el Otell, and Alex P. G. Robinson "Spin-on-carbon hard masks utilising fullerene derivatives", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977927 (25 March 2016); https://doi.org/10.1117/12.2219212

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available