2 August 2016 Front Matter: Volume 9780
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9780, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

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Author(s), “Title of Paper,” in Optical Microlithography XXIX, edited by Andreas Erdmann, Jongwook Kye, Proceedings of SPIE Vol. 9780 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510600157

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Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Aarts, Igor, 0B

Adam, Kostas, 19

Agudelo, Viviana, 0U

Alagna, Paolo, 08, 0K

Amako, Jun, 1T

Amézquita, Ricardo, 0U

Amézquita, Sebastián, 0U

Anunciado, Roy, 1Q

Arnold, John, 06

Asthana, Abhishek, 0J

Bailey, Todd, 06, 0N

Bar, Yuval, 0N

Barkelid, Maria, 1Q

Baselmans, Jan, 08

Bayle, Sébastian, 1U

Bernal, Andrés, 0U

Bernasconi, Johana, 16

Bleiman, Ben, 06

Böcker, Paul, 0A

Bolton, John, 06

Bouman, Wim, 0X

Bourgin, Yannick, 0R, 14

Bramati, Arianna, 0V, 16

Bräuer, Andreas, 0T

Braylovska, Mariya, 1O

Brunner, Timothy A., 0W

Burbine, Andrew, 0I

Burkhardt, Martin, 0E

Burns, Sean, 06

Byun, Jin-Moo, 0A

Cacouris, Ted, 1G, 1H

Calderón, Jorge, 0U

Chahine, Charlotte, 07

Chang, Chansam, 0X

Chen, Ao, 19, 1A

Chen, Chun-Kuang, 1R

Chen, K. C., 18

Chen, Lijun, 1P

Chen, Minfeng, 1R

Chen, Xiuguo, 1M

Chen, Yulu, 1S

Choi, Suhyeong, 0H

Choi, Young Sin, 09

Chou, Shuo-Yen, 1R

Chung, Angeline, 19

Cline, Brian, 0P

Colburn, Matthew, 06

Conley, Will, 08, 0K, 1G

Cremer, Sébastien, 1U

de Boeij, Wim P., 0B, 0X, 11

de Graaf, Roelof, 0B, 0X, 11

Dirrenberger, Mathieu, 1U

Dixit, Girish, 07

Droste, Richard, 0B, 0X, 11

Dusa, Mircea, 07

Eckstein, Hans-Christoph, 0T

El-Sewefy, Omar, 19, 1P

Enami, Tatsuo, 1J

Erdmann, Andreas, 0M, 0Q

Farys, Vincent, 1U

Faure, Tom, 06

Felix, Nelson, 06

Fischer, Dan, 06

Foong, Yee Mei, 19, 1A

Fryer, David, 0I

Fu, Chien-Chung, 17

Fühner, Tim, 0M

Fujimoto, Issei, 12

Fukuda, Hitomi, 1J

Furubayashi, Ken, 0O

Gao, Gen-Sheng, 1P

Gao, Weimin, 1O

Gau, Tsai-Sheng, 1R

Ge, Adam, 1S

Gomez, Juan-Manuel, 1Q

Graur, Ioana, 06

Grishkanich, Alexander, 1L

Gu, Honggang, 1M

Guerrero, James, 1A

Hanson, Justin K., 1Q

Hasegawa, Keisuke, 0Y

Hayakawa, Akira, 12

Hellin, David, 07

Herzig, Hans Peter, 0V, 16

Hirayama, Toru, 0Y, 12

Hirayanagi, Noriyuki, 04

Hong, Le, 1C

Hsu, Stephen, 0K, 1A

Hu, C. M., 18

Hu, Lin, 06, 0N

Hu, Sophia, 1J

Hwang, Hyunwoo, 0B

Iida, Kazunori, 0O

Ikezawa, Hironori, 0Y

Inoue, Daisuke, 0Y

Isago, Susumu, 0Y

Ishida, Keisuke, 10

Ishiyama, Satoshi, 0Y, 12

Jackson, M., 1G

Jaenen, Patrick, 07

Jang, Jonghoon, 0X

Jang, Se Yeon, 09

Jedamzik, Ralf, 1K

Jeong, Inseok, 13

Jeong, Jong-Mun, 0A

Jeong, Joohong, 0D

Ji, Liang, 1A

Jiang, Hao, 1F, 1M

Jovanović, Milenko, 0A

Jung, Sunwook, 0N

Kam, Benjamin, 07

Kanawade, Dinesh, 1H

Kang, Junghyun, 13

Kang, Young Seog, 09, 0B, 0X

Kascheev, Sergey, 1L

Käsebier, Thomas, 14

Kawahara, Hidetaka, 0Y

Ke, Xianhua, 1F

Kikuchi, Takahisa, 0Y

Kim, Cheolkyun, 1E

Kim, Daewoo, 13

Kim, Doyoun, 0D

Kim, Gwang-Gon, 0A

Kim, Hyeongsoo, 13

Kim, Keunjun, 13

Kim, Mingu, 0D

Kim, Min-Suk, 0A

Kim, Ryoung-han, 1S

Kim, Young Ha, 0B, 0X

Kim, Young Ki, 1Q

Kim, Young, 0N

Kinder, Robert, 0R

Kitamura, Yasuhiro, 0Y

Kley, Ernst-Bernhard, 14

Klostermann, Ulrich, 1O

Koek, Bert, 11

Koizumi, Yukio, 0Y

Kok, Haico, 0B

Kong, Jeong-Heung, 09, 0B, 0X

Krishnan, Navaneetha, 1S

Kubis, Michael, 07

Kujanpaa, Veli, 1L

Kumazaki, Takahito, 10, 1I

Kunisch, Clemens, 1K

Kupers, Michiel, 0A

Kurosu, Akihiko, 10, 1I

Lafferty, Neal, 19, 1P

Lam, Edmund Y., 0Q

Lee, Byeongsoo, 0B, 0X

Lee, Dong Han, 09

Lee, Jae Il, 09

Lee, Jeongjin, 0B

Lee, Shawn, 1Q

Lee, Sungkoo, 13

Lee, Taehyeong, 1E

Leino, Gerald, 0W

Leitel, Robert, 0T

Leray, Philippe, 07

Levi, Shimon, 1S

Li, Jianliang, 0N

Li, Sikun, 1V

Li, Xiaoyang, 1A

Liang, Jim, 0N

Lim, Young-Wan, 0A

Lin, Te-Hsun, 17

Lippincott, George, 1C

Liu, Guangyi, 1N

Liu, Qingwei, 1C

Liu, Ru-Gun, 1R

Liu, Shiyuan, 0Q, 1F, 1M

Liubich, Vlad, 1C

Lo, Fred, 18

Lobb, Granger, 06, 0N

Lu, Zengxiong, 1N

Luca, Melisa, 07

Luo, S., 1G

Lv, Wen, 1F

Mahajan, Sunit, 0W

Masaki, Kazuo, 12

Mason, Christopher, 0B

Matsunaga, Takashi, 10, 1I

McLaren, Matthew, 11

Meiring, Jason, 19, 1P

Mellmann, Jörg, 0E

Meng, Qingbin, 1N

Mernier, Guillaume, 07

Michalak, Przemysław, 0M

Mignot, Yann, 06

Millequant, Matthieu, 1U

Miyamoto, Hirotaka, 10, 1I

Miyoshi, Seiro, 0O

Mizoguchi, Hakaru, 10, 1I

Moon, Woosung, 0D

Morgenfeld, Bradley, 0W

Morisaki, Tsuyoshi, 0O

Muelders, Thomas, 1O

Mukai, Hidefumi, 0O

Mulkens, Jan, 07

Müller, Marcus, 0M

Murthy, S., 1G

Nagahiro, Akimasa, 0Y

Nakashima, Toshiharu, 0Y

Nam, Young Sun, 09

Neefs, Patrick, 0X

Nieder, Johannes, 1K

Nikolsky, Peter, 1Q

Nishinaga, Hisashi, 1P

O'Brien, Kevin, 1H

Ogino, Atsushi, 0N

Oh, Seyoung, 0D

Ohmura, Yasuhiro, 0Y, 12

Ohta, Takeshi, 10, 1I

Onda, Minoru, 0Y

Orlando, Bastien, 1U

Orozco-Rey, Juan Carlos, 0M

Owa, Soichi, 04

Paarhuis, Bart, 0B

Palmer, Shane R., 0C

Pan, David Z., 0P

Park, Chanha, 0D

Park, Daejin, 0D

Park, Youngjoon, 1E

Partel, S., 15

Postnikov, Sergei V., 1U

Power, Dave, 0J

Preil, Moshe E., 02

Pulido, Iván, 0U

Puthankovilakam, Krishnaparvathy, 0V

Qi, Yuejing, 1N

Rausa, E., 1G

Rechtsteiner, Gregory, 08, 1G

Reijnen, Liesbeth, 07

Renwick, Stephen P., 0C

Rijke, Arij, 0X

Rincón, Oscar, 0U

Roman, Yzzer, 1H

Romero, Luis, 0U

Ryan, Kevin, 0A

Sakamoto, Julia A., 0C

Sakamoto, Yoshifumi, 06

Samudrala, Pavan, 1Q

Sato, Naoki, 0O

Savinainen, Timo, 1L

Scharf, Toralf, 0V, 16

Schiavone, Patrick, 1U

Schleicher, Philipp, 0T

Schneider, Loïc, 1U

Schramm, Jessy, 1A

Shamma, Nader, 07

Shaw, Joe, 1A

Shen, Xuan, 1C

Shiba, Yuji, 12

Shibazaki, Yuichi, 12

Shim, Seongbo, 0H

Shin, Youngsoo, 0H

Sho, Koutarou, 0O

Slonaker, Steven D., 0C

Smith, Bruce W., 0I

Sobieski, Daniel, 07

Sochal, Inez, 0A

Spence, Chris, 05

Steiner, K., 1G

Stumpf, Marko, 0T

Sturtevant, John, 0I, 0N, 19

Su, Jiani, 1N

Suh, Jung-Joon, 0A

Sukhov, Evgenii, 1O

Sun, Kyu-Tae, 0A

Sun, Lei, 1S

Takahisa, Kenji, 1J

Takase, Yohei, 0Y

Tang, Feng, 1V

Thornes, Josh, 1H

Tian, Ye, 1Q

Timoshkov, Vadim, 08

Tiphine, Charles, 1U

Toda, Yusuke, 06

Tranquillin, Céline, 1U

Tritchkov, Alexander, 0E

Tsai, Hsinyu, 0E

Tsuge, Yosuke, 0Y

Tsushima, Hiroaki, 10, 1I

Tünnermann, Andreas, 0T

Tyminski, Jacek K., 0C

Urban, G., 15

Usui, Satoshi, 0O

van Bussel, Bart, 0X

Verduijn, Erik, 1S

Vergaij-Huizer, Lydia, 0A

Vertommen, Johan, 07

Viatkina, Katja, 07

Viswanathan, Ramya, 06

Voelkel, Reinhard, 0V, 16

Vogler, Uwe, 0V

Voigt, Daniel, 14

Wang, Joe, 1A

Wang, Lei, 1V

Wang, Wenhui, 1S

Wang, Xiangzhao, 1V

Wang, Yun-Wen, 17

Weber, Peter, 1K

Wei, Fang, 1P

Weichelt, Tina, 0R

Weichselbaum, Stefan, 0B, 0X, 11

Welling, Ulrich, 0M

Westerhoff, Thomas, 1K

Wilkinson, Bill, 0J

Wise, Rich, 07

Wistrom, Richard, 06

Won, Hwa-Yeon, 0A

Wong, Cheuk W., 0W

Wong, Patrick, 08

Word, James, 1C

Wu, Xiaofei, 0Q

Xu, Xiaoqing, 0P

Xu, Yongan, 06, 0E

Yamaguchi, Shinji, 0O

Yang, Chaoxing, 1V

Yang, Elvis, 18

Yang, Hyunjo, 0D

Yang, T. H., 18

Yang, Yin-Kuang, 17

Yeric, Greg, 0P

Yim, Donggyu, 1E

Yoda, Yasushi, 12

Yoo, Gyun, 1E

Yoo, Youngsun, 1J

You, Taejun, 1E

Yu, Shinozaki, 1T

Yu, Zhitang, 1C

Yune, Hyoungsoon, 0D

Zeitner, Uwe D., 0R, 0T, 14

Zhang, Chenming, 1P

Zhang, Chuanwei, 1M

Zhang, Liguo (Recoo), 1C, 1P

Zhang, Wei, 1P

Zhang, Xiaoxiao, 1S

Zhang, Xima, 1C

Zhao, Qian, 0K

Zhevlakov, Alexander, 1L

Zhou, Hua, 1S

Zhou, Yue, 0W

Zhu, Cynthia, 1C, 1P

Zhu, Jun, 1P

Conference Committee

Symposium Chair

  • Mircea V. Dusa, ASML US, Inc. (United States)

Symposium Co-Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Conference Chair

  • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

Conference Co-Chair

  • Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

Conference Program Committee

  • Pary Baluswamy, Micron Technology, Inc. (United States)

  • Will Conley, Cymer, Inc. (United States)

  • Jo Finders, ASML Netherlands B.V. (Netherlands)

  • Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Bernd Geh, Carl Zeiss SMT Inc. (United States)

  • Yuri Granik, Mentor Graphics Corporation (United States)

  • Harsha Grunes, Intel Corporation (United States)

  • Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Sachiko Kobayashi, Toshiba Corporation (Japan)

  • Kafai Lai, IBM Corporation (United States)

  • Soichi Owa, Nikon Corporation (Japan)

  • Ryan Pearman, Synopsys, Inc. (United States)

  • John S. Petersen, Periodic Structures, Inc. (United States)

  • Mark C. Phillips, Intel Corporation (United States)

  • Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • Xuelong Shi, Semiconductor Manufacturing International Corporation (China)

  • Bruce W. Smith, Rochester Institute of Technology (United States)

  • Kazuhiro Takahashi, Canon Inc. (Japan)

  • Geert Vandenberghe, IMEC (Belgium)

  • Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

Session Chairs

  • Opening Remarks

    • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

      Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

  • 1 Keynote Session

    Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

    Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

  • 2 Pushing Optical Limit

    Kafai Lai, IBM Thomas J. Watson Research Center (United States)

    Geert Vandenberghe, IMEC (Belgium)

  • 3 Image and Process Control

    Yuri Granik, Mentor Graphics Corporation (United States)

    Kazuhiro Takahashi, Canon Inc. (Japan)

  • 4 Negative Tone Materials and Processes: Joint Session with Conference 9779 and 9780

    Sean D. Burns, IBM Corporation (United States)

    Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • 5 Computational Lithography

    Soichi Owa, Nikon Corporation (Japan)

    John S. Petersen, Petersen Advanced Lithography, Inc. (United States)

  • 6 Material and Process Driven Resolution Enhancements

    Will E. Conley, Cymer LLC (United States)

    Harsha Grunes, Intel Corporation (United States)

  • 7 Design and Litho Optimization: Joint Session with Conferences 9780 and 9781

    Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • 8 Non-IC Applications

    Sachiko Kobayashi, Toshiba Corporation (Japan)

    Reinhard Völkel, SUSS MicroOptics SA (Switzerland)

  • 9 Overlay Optimization: Joint Session with Conferences 9778 and 9780

    John C. Robinson, KLA-Tencor Corporation (United States)

    Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • 10 Toolings

    Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

    Bernd Geh, Carl Zeiss SMT Inc. (United States)

  • Concluding Remarks

    • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

      Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9780", Proc. SPIE 9780, Optical Microlithography XXIX, 978001 (2 August 2016); doi: 10.1117/12.2239746; https://doi.org/10.1117/12.2239746
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