The present work demonstrates the application of Genetic Algorithm (GA) technique for optimizing OPC recipes. GA is a search technique that mimics Darwinian natural selection and has applications in various science and engineering disciplines. In this case, GA search heuristic is applied to two problems: (a) an overall OPC recipe optimization with respect to selected parameters and, (b) application of GA to improve printing and via coverage at line end geometries. As will be demonstrated, the optimized recipe significantly reduced the number of ORC violations for case (a). For case (b) line end for various features showed significant printing and filling improvement.
ACCESS THE FULL ARTICLE
Abhishek Asthana, Bill Wilkinson, Dave Power, "OPC recipe optimization using genetic algorithm," Proc. SPIE 9780, Optical Microlithography XXIX, 97800J (15 March 2016);