Recent improvements in bandwidth control have been realized in the XLR platform with Cymer’s DynaPulseTM control technology. This reduction in bandwidth variation translates in the further reduction of CD variation in device structures 5,6. The Authors will review the methodology for determining the impact that bandwidth variation has on CD dose, focus, pitch and bandwidth, which is required to build a dynamic model. This assists in understanding the impact that bandwidth variability has on the accuracy of the Source and Mask optimization and the overall OPC model, which is reviewed and demonstrated.
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Will Conley, Paolo Alagna, Stephen Hsu, Qian Zhao, "Impact of bandwidth variation on OPC model accuracy," Proc. SPIE 9780, Optical Microlithography XXIX, 97800K (23 March 2016);