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23 March 2016 Impact of bandwidth variation on OPC model accuracy
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Over the years, Lithography Engineers continue to focus on CD control, overlay and process capability to meet current node requirements for yield and device performance. Reducing or eliminating variability in any process will have significant impact, but the sources of variability in any lithography process are many. The goal from the light source manufacturer is to further enable capability and reduce variation through a number of parameters. (1, 2, 3, 4)

Recent improvements in bandwidth control have been realized in the XLR platform with Cymer’s DynaPulseTM control technology. This reduction in bandwidth variation translates in the further reduction of CD variation in device structures 5,6. The Authors will review the methodology for determining the impact that bandwidth variation has on CD dose, focus, pitch and bandwidth, which is required to build a dynamic model. This assists in understanding the impact that bandwidth variability has on the accuracy of the Source and Mask optimization and the overall OPC model, which is reviewed and demonstrated.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Will Conley, Paolo Alagna, Stephen Hsu, and Qian Zhao "Impact of bandwidth variation on OPC model accuracy", Proc. SPIE 9780, Optical Microlithography XXIX, 97800K (23 March 2016);

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