15 March 2016 High-order aberration control during exposure for leading-edge lithography projection optics
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Abstract
High throughput with high resolution imaging has been key to the development of leading-edge microlithography. However, management of thermal aberrations due to lens heating during exposure has become critical for simultaneous achievement of high throughput and high resolution. Thermal aberrations cause CD drift and overlay error, and these errors lead directly to edge placement errors (EPE). Management and control of high order thermal aberrations is a critical requirement. In this paper, we will show practical performance of the lens heating with dipole and other typical illumination conditions for finer patterning. We confirm that our new control system can reduce the high-order aberrations and enable critical-dimension uniformity CDU during the exposure.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Ohmura, Yasuhiro Ohmura, Yosuke Tsuge, Yosuke Tsuge, Toru Hirayama, Toru Hirayama, Hironori Ikezawa, Hironori Ikezawa, Daisuke Inoue, Daisuke Inoue, Yasuhiro Kitamura, Yasuhiro Kitamura, Yukio Koizumi, Yukio Koizumi, Keisuke Hasegawa, Keisuke Hasegawa, Satoshi Ishiyama, Satoshi Ishiyama, Toshiharu Nakashima, Toshiharu Nakashima, Takahisa Kikuchi, Takahisa Kikuchi, Minoru Onda, Minoru Onda, Yohei Takase, Yohei Takase, Akimasa Nagahiro, Akimasa Nagahiro, Susumu Isago, Susumu Isago, Hidetaka Kawahara, Hidetaka Kawahara, } "High-order aberration control during exposure for leading-edge lithography projection optics", Proc. SPIE 9780, Optical Microlithography XXIX, 97800Y (15 March 2016); doi: 10.1117/12.2218840; https://doi.org/10.1117/12.2218840
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