15 March 2016 The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
Author Affiliations +
Proceedings Volume 9780, Optical Microlithography XXIX; 978010 (2016); doi: 10.1117/12.2219379
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
Multiple patterning ArF immersion lithography has been expected as the promising technology to satisfy tighter leading edge device requirements. One of the most important features of the next generation lasers will be the ability to support green operations while further improving cost of ownership and performance. Especially, the dependence on rare gases, such as Neon and Helium, is becoming a critical issue for high volume manufacturing process.

The new ArF excimer laser, GT64A has been developed to cope with the reduction of operational costs, the prevention against rare resource shortage and the improvement of device yield in multiple-patterning lithography. GT64A has advantages in efficiency and stability based on the field-proven injection-lock twin-chamber platform (GigaTwin platform). By the combination of GigaTwin platform and the advanced gas control algorithm, the consumption of rare gases such as Neon is reduced to a half. And newly designed Line Narrowing Module can realize completely Helium free operation. For the device yield improvement, spectral bandwidth stability is important to increase image contrast and contribute to the further reduction of CD variation. The new spectral bandwidth control algorithm and high response actuator has been developed to compensate the offset due to thermal change during the interval such as the period of wafer exchange operation. And REDeeM Cloud™, new monitoring system for managing light source performance and operations, is on-board and provides detailed light source information such as wavelength, energy, E95, etc.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keisuke Ishida, Takeshi Ohta, Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi, "The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations", Proc. SPIE 9780, Optical Microlithography XXIX, 978010 (15 March 2016); doi: 10.1117/12.2219379; http://dx.doi.org/10.1117/12.2219379
PROCEEDINGS
10 PAGES


SHARE
KEYWORDS
Actuators

Neon

Semiconducting wafers

Helium

Control systems

Laser development

Gas lasers

RELATED CONTENT

Smart sampling for process control
Proceedings of SPIE (March 28 2017)
Fabrication of membrane mask for next-generation lithography
Proceedings of SPIE (December 30 1999)
Scalable industrial manufacturing of DEAP
Proceedings of SPIE (April 06 2009)
Four-element fiber laser hydrophone array
Proceedings of SPIE (November 04 2009)

Back to Top