15 March 2016 The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
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Abstract
Multiple patterning ArF immersion lithography has been expected as the promising technology to satisfy tighter leading edge device requirements. One of the most important features of the next generation lasers will be the ability to support green operations while further improving cost of ownership and performance. Especially, the dependence on rare gases, such as Neon and Helium, is becoming a critical issue for high volume manufacturing process.

The new ArF excimer laser, GT64A has been developed to cope with the reduction of operational costs, the prevention against rare resource shortage and the improvement of device yield in multiple-patterning lithography. GT64A has advantages in efficiency and stability based on the field-proven injection-lock twin-chamber platform (GigaTwin platform). By the combination of GigaTwin platform and the advanced gas control algorithm, the consumption of rare gases such as Neon is reduced to a half. And newly designed Line Narrowing Module can realize completely Helium free operation. For the device yield improvement, spectral bandwidth stability is important to increase image contrast and contribute to the further reduction of CD variation. The new spectral bandwidth control algorithm and high response actuator has been developed to compensate the offset due to thermal change during the interval such as the period of wafer exchange operation. And REDeeM Cloud™, new monitoring system for managing light source performance and operations, is on-board and provides detailed light source information such as wavelength, energy, E95, etc.
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Keisuke Ishida, Keisuke Ishida, Takeshi Ohta, Takeshi Ohta, Hirotaka Miyamoto, Hirotaka Miyamoto, Takahito Kumazaki, Takahito Kumazaki, Hiroaki Tsushima, Hiroaki Tsushima, Akihiko Kurosu, Akihiko Kurosu, Takashi Matsunaga, Takashi Matsunaga, Hakaru Mizoguchi, Hakaru Mizoguchi, "The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations", Proc. SPIE 9780, Optical Microlithography XXIX, 978010 (15 March 2016); doi: 10.1117/12.2219379; https://doi.org/10.1117/12.2219379
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