Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Yannick Bourgin; Daniel Voigt; Thomas Käsebier; Ernst-Bernhard Kley; Uwe D. Zeitner

doi:10.1117/12.2218610

15 March 2016 Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Ernst-Bernhard Kley, Uwe D. Zeitner

Author Affiliations +

Proceedings Volume 9780, Optical Microlithography XXIX; 978014 (2016) https://doi.org/10.1117/12.2218610
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. The high resolution interferogram is realized by the overlapping and the interference of the propagating beams. By applying the techniques known as Self-Aligned Double Patterning (SADP), it´s possible to decrease the period of the fabricated grating (350 nm) by a factor of two, and thus reaching the 90nm structure width. As application, metallic gratings have been fabricated operating as wire grid polarizer (WGP).

Citation Download Citation

Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Ernst-Bernhard Kley, and Uwe D. Zeitner "Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)", Proc. SPIE 9780, Optical Microlithography XXIX, 978014 (15 March 2016); https://doi.org/10.1117/12.2218610

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