15 March 2016 Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)
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Proceedings Volume 9780, Optical Microlithography XXIX; 978014 (2016); doi: 10.1117/12.2218610
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. The high resolution interferogram is realized by the overlapping and the interference of the propagating beams. By applying the techniques known as Self-Aligned Double Patterning (SADP), it´s possible to decrease the period of the fabricated grating (350 nm) by a factor of two, and thus reaching the 90nm structure width. As application, metallic gratings have been fabricated operating as wire grid polarizer (WGP).
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Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Ernst-Bernhard Kley, Uwe D. Zeitner, "Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)", Proc. SPIE 9780, Optical Microlithography XXIX, 978014 (15 March 2016); doi: 10.1117/12.2218610; http://dx.doi.org/10.1117/12.2218610
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KEYWORDS
Photomasks

Lithography

Metals

Photoresist materials

Diffraction gratings

Polymers

Coating

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