15 March 2016 Layer aware source mask target optimization
Author Affiliations +
Abstract
In this paper, we present the approach and results of layer-aware source mask target optimization. In this approach, the design target is co-optimized during source mask optimization (SMO) by considering inter-layer constraints. We tested the method on a 2x nm node metal layer by using both standard and customized cost functions for source optimization. Variable targets were defined for two process window limiting critical pattern cells, with contact-to-metal and metal-tovia coverage rules taken into consideration. The results indicate that layer-aware source mask target optimization gives consistent process window improvement over conventional SMO. The optimized targets prove to be a good balance between lithography process window and post-etch inter-layer coverage margin.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ao Chen, Ao Chen, Yee Mei Foong, Yee Mei Foong, Jessy Schramm, Jessy Schramm, Liang Ji, Liang Ji, Stephen Hsu, Stephen Hsu, James Guerrero, James Guerrero, Xiaoyang Li, Xiaoyang Li, Joe Shaw, Joe Shaw, Joe Wang, Joe Wang, "Layer aware source mask target optimization", Proc. SPIE 9780, Optical Microlithography XXIX, 97801A (15 March 2016); doi: 10.1117/12.2219864; https://doi.org/10.1117/12.2219864
PROCEEDINGS
9 PAGES


SHARE
Back to Top