15 March 2016 A novel full chip process window OPC based on matrix retargeting
Author Affiliations +
Abstract
Process window OPC (PWOPC) is widely used in advanced technology nodes as one of the most important resolution enhancement techniques (RET).1 PWOPC needs to consider not only edge placement error (EPE) from nominal condition simulations, but also constraints based on process variation simulations, such as pinch and bridge related requirements based on process variation band (PVBAND). Those constraints can be challenging to meet as feature size continues to shrink in advanced nodes.

In this paper a novel matrix retargeting based PWOPC was developed to find optimal OPC solutions by solving constraints-based matrix and applying minimal retargeting as needed.2 Experiment results showed enhanced process window and reasonable performance.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xima Zhang, Xima Zhang, Zhitang Yu, Zhitang Yu, Qingwei Liu, Qingwei Liu, Xuan Shen, Xuan Shen, Liguo Zhang, Liguo Zhang, Le Hong, Le Hong, Vlad Liubich, Vlad Liubich, George Lippincott, George Lippincott, Cynthia Zhu, Cynthia Zhu, James Word, James Word, } "A novel full chip process window OPC based on matrix retargeting", Proc. SPIE 9780, Optical Microlithography XXIX, 97801C (15 March 2016); doi: 10.1117/12.2219913; https://doi.org/10.1117/12.2219913
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

An optimized OPC and MDP flow for reducing mask write...
Proceedings of SPIE (September 24 2010)
Merits of cellwise model-based OPC
Proceedings of SPIE (May 02 2004)
OPC modeling by genetic algorithm
Proceedings of SPIE (May 11 2004)
Verifying RET mask layouts
Proceedings of SPIE (July 11 2002)

Back to Top