In this paper, we will introduce experimental results of wafer topography effect using various test patterns and propose a simple method that could effectively reduce wafer topography effect.
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Critical dimension metrology
Optical proximity correction
Scanning electron microscopy
Taejun You, Taehyeong Lee, Gyun Yoo, Youngjoon Park, Cheolkyun Kim, Donggyu Yim, "Simple method for decreasing wafer topography effect for implant mask," Proc. SPIE 9780, Optical Microlithography XXIX, 97801E (15 March 2016);