The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Hirotaka Miyamoto; Takahito Kumazaki; Hiroaki Tsushima; Akihiko Kurosu; Takeshi Ohta; Takashi Matsunaga; Hakaru Mizoguchi

doi:10.1117/12.2218778

15 March 2016 The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 9780, Optical Microlithography XXIX; 97801I (2016) https://doi.org/10.1117/12.2218778
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Multiple patterning ArF immersion lithography has been expected as the promising technology to satisfy tighter leading edge device requirements. A new ArF excimer laser, GT64A has been developed to cope with the prevention against rare resource shortage and the reduction of operational costs. GT64A provides the sophisticated technologies which realize the narrow spectral bandwidth with helium free operation. A helium gas purge has usually been employed due to the low refractive index variation with temperature rises within a line narrowing module(LNM). Helium is a non-renewable resource and the world’s reserves have been running out. Nitrogen gas with an affordable price has been used as an alternative purge gas of helium on the restrictive condition of low thermal loads. However, the refractive index variation of nitrogen gas is approximately ten times more sensitive to temperature rises than that of helium, and broadens a spectral bandwidth in the high duty cycle operations. The new LNM design enables heat effect in laser shooting at optical elements and mechanical components in the vicinity of an optical path to be lower. This reduces thermal wavefront deformation of a laser beam without helium gas purge within LNM, and narrows a spectrum bandwidth without helium purge. Gigaphoton proved that the new LNM enabled E95 bandwidth without control to improve a lot with nitrogen purge.

Citation Download Citation

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, and Hakaru Mizoguchi "The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation", Proc. SPIE 9780, Optical Microlithography XXIX, 97801I (15 March 2016); https://doi.org/10.1117/12.2218778

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available