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15 March 2016 Spatial conversion of excimer laser beam (Retraction Notice)
Alexander Grishkanich, Alexander Zhevlakov, Sergey Kascheev, Veli Kujanpaa, Timo Savinainen
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Proceedings Volume 9780, Optical Microlithography XXIX; 97801L (2016) https://doi.org/10.1117/12.2219934
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
This paper, originally published on 15 March 2016, was retracted from the SPIE Digital Library on 14 December 2021 upon verification that it was a duplicate publication of the following paper:

A. Zhevlakov, E. Gavrilov, S. Kascheev, V. Kujanpaa, and T. Savinainen, “Optical attachment for transformation of output beam of excimer laser,” Proc. SPIE 7822, Laser Optics 2010, 78220C (22 March 2011); https://doi.org/10.1117/12.885210
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Alexander Grishkanich, Alexander Zhevlakov, Sergey Kascheev, Veli Kujanpaa, and Timo Savinainen "Spatial conversion of excimer laser beam (Retraction Notice)", Proc. SPIE 9780, Optical Microlithography XXIX, 97801L (15 March 2016); https://doi.org/10.1117/12.2219934
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KEYWORDS
Objectives
Excimer lasers
Ultraviolet radiation
Materials processing
UV optics
Image processing
Optical components
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