Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device

Jun Amako; Shinozaki Yu

doi:10.1117/12.2229178

15 March 2016 Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device

Jun Amako, Shinozaki Yu

Author Affiliations +

Proceedings Volume 9780, Optical Microlithography XXIX; 97801T (2016) https://doi.org/10.1117/12.2229178
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we demonstrate a dual-wavelength diffractive beam splitter to be used in parallel laser processing. The novel optical element, which is formed in a transparent material, generates two beam arrays at different wavelengths and allows their overlap at the process points on a workpiece. Since the splitter has a stochastically designed, complex, and deep surface profile, there is limited freedom in selecting a fabrication method. We designed the splitter using a simulated annealing algorithm and fabricated it in a photoresist through maskless exposure by using a digital micromirror device. We characterized the designed splitter, thereby corroborating the proposed beam-splitting concept.

Citation Download Citation

Jun Amako and Shinozaki Yu "Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device", Proc. SPIE 9780, Optical Microlithography XXIX, 97801T (15 March 2016); https://doi.org/10.1117/12.2229178

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