15 March 2016 Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device
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Abstract
In this paper, we demonstrate a dual-wavelength diffractive beam splitter to be used in parallel laser processing. The novel optical element, which is formed in a transparent material, generates two beam arrays at different wavelengths and allows their overlap at the process points on a workpiece. Since the splitter has a stochastically designed, complex, and deep surface profile, there is limited freedom in selecting a fabrication method. We designed the splitter using a simulated annealing algorithm and fabricated it in a photoresist through maskless exposure by using a digital micromirror device. We characterized the designed splitter, thereby corroborating the proposed beam-splitting concept.
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Jun Amako, Jun Amako, Shinozaki Yu, Shinozaki Yu, "Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device", Proc. SPIE 9780, Optical Microlithography XXIX, 97801T (15 March 2016); doi: 10.1117/12.2229178; https://doi.org/10.1117/12.2229178
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