28 June 2016 Front Matter: Volume 9781
This PDF file contains the front matter associated with SPIE Proceedings Volume 9781, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

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Author(s), “Title of Paper,” in Design-Process-Technology Co-optimization for Manufacturability X, edited by Luigi Capodieci, Jason P. Cain, Proceedings of SPIE Vol. 9781 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510600164

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  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B ... 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.


Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Ali, Hussein, 0W

Al-Imam, Mohamed, 0J

Amir, Nuriel, 18

Asada, Kunihiro, 10

Asthana, Abhishek, 12

Baert, R., 0Q

Bahr, Mohamed, 14

Baldick, Ross, 0M

Ban, Yongchan, 0G

Batarseh, Fadi, 09

Bekaert, Joost, 0N

Bonnecaze, Roger T., 11

Bravo, Jaime, 09, 0K

Cain, Jason P., 08, 0I

Capodieci, Luigi, 0B

Cecil, Tom, 16

Chang, Jinman, 0R

Chee, Jansen, 0K

Chen, Alek C., 07

Chen, Ao, 15

Chen, Howard, 18

Chen, Kuang-Han, 0G, 0K, 13

Chen, Xiaohui, 16

Chen, Yijian, 03, 0E, 0P, 0T

Chen, Ying, 0X

Chen, Yulu, 04

Cheng, Qi, 0E

Chiou, Tsann-Bim, 07

Chiu, Yang-Chih, 13

Choi, Bumjin, 0R

Choi, Eunjoo, 0G

Choi, Jinwoo, 0V

Choi, Seiryung, 0V

Chopra, Meghali, 11

Clevenger, Larry, 06

Croes, Kris, 0N

Culp, James, 06

Curtice, Mark, 12

Debacker, P., 0Q

Deeth, Steven, 16

Dehaene, Wim, 0N

Ding, Hua, 0A, 0L, 0Z, 13

Du, Chunshan, 0W

Duan, Yingli, 0X

Dusa, Mircea, 07, 0Q

Ekerdt, John, 11

ElManhawy, Wael, 0I, 0J, 0W

Fakhry, Moutaz, 0I

Farys, Vincent, 0O, 0U

Feng, Jui-Hsuan, 12

Fenouillet-Beranger, C., 0O

Firouzi, F., 0Q

Gao, Shao Wen, 12

Gbondo-Tugbawa, Tamba, 0G, 0K, 13

Gemmink, J.-W., 0S

Gennari, Frank E., 08, 09

Gerousis, V., 0Q

Gower-Hall, Aaron, 0K, 13

Gronheid, Roel, 0N

Hamed Fatehy, Ahmed, 0Y

Hamouda, Ayman, 15

Han, Daehan, 0R

Han, Sang Min, 0G, 0K

Han, Ting, 03, 0E, 0P

Harb, Mohammed, 0J

Hasan, T., 0S

Hong, Aeran, 0R

Hong, Chuyang, 03, 0E

Hong, Hyeongsun, 0R, 0V

Hong, Sid, 0W

Hsing, Henry, 18

Hsu, Danny, 0W

Hui, Colin, 0K

Hurat, Philippe, 09

Huynh-Bao, Trong, 02

Hwang, Sungwook, 0J

Hyun, Daijoon, 0F

Ikeda, Makoto, 10

Ikeno, Rimon, 10

Jin, Gyoyoung, 0R

Jourlin, Y., 0S

Kabeel, Aliaa, 0W

Kang, Jinyoung, 0R

Kang, Minsoo, 0J

Kang, Namjung, 0V

Karageorgos, Evangelos, 0N

Karageorgos, Ioannis, 0N

Katakamsetty, Ushasree, 0K

Kim, Cheolkyun, 14

Kim, Chin, 0J

Kim, Hyoung Jun, 0R

Kim, Hyoungsun, 0R

Kim, Ryoung-han, 04

Kim, Seoksan, 0V

Kim, Taeheon, 0R

Kim, Yonghyeon, 0R

Kimura, Taiki, 0C

Kotani, Toshiya, 0H

Kotb, Rehab, 0Y

Krishnamoorthy, Karthik, 09

Kwa, Denny, 16

Kwan, Joe, 0I, 0J, 0W

Lai, Ya-Chieh, 08, 09, 0A, 0L, 0Z

Landié, Guillaume, 0U

Lee, Brian, 0K, 13

Lee, Jeemyung, 05

Lee, Jong-hyun, 0J

Lee, Joosung, 0R

Lee, Kweonjae, 0R

Lee, Kyupil, 0V

Lee, Kyusun, 0R

Lee, Robben, 0W

Lee, Seongmin, 05

Lee, Sho Shen, 18

Le-Gratiet, B., 0S

Lei, Junjiang, 0X

Li, Flora, 13

Li, Helen, 0W, 13

Li, Yongfu, 0K

Liebmann, Lars, 06

Lin, Chia Ching, 18

Lin, Yibo, 0M

Lio, En Chuan, 18

Liu, Hongyi, 03, 0P

Liu, JinBing, 13

Liu, Kince, 18

Liu, Qing Wei, 0L

Liu, ZhengFang (Square), 0W, 13

Lucas, Kevin, 16

Lutich, Andrey, 17

Madhavan, Sriram, 09, 0B

Madkour, Kareem, 0I, 0J, 0W

Maruyama, Satoshi, 10

Matsunawa, Tetsuaki, 0C, 0H

Matti, L., 0Q

McIntyre, G., 0Q

Meng, Xiaodong, 16

Mercha, Abdelkarim, 02

Mita, Yoshio, 10

Nojima, Shigeki, 0C, 0H

Omran, Ahmed, 17

Pack, Bob, 09

Pan, David Z., 0C, 0M

Pang, Jenny, 0A, 0L

Park, Jaekyun, 0V

Park, Sungmin, 0V

Pathak, Piyush, 09

Power, Dave, 15

Prentice, C., 0S

Qiao, Ying, 0D

Raghavan, P., 0Q

Ronse, K., 0Q

Ryckaert, Julien, 02, 0N, 0Q

Sakhare, Sushil, 02

Salama, Mohamed, 12, 15

Schneider, L., 0O

Schroeder, Uwe Paul, 09, 0B, 17

Serret, E., 0O

Shao, Dongbing, 06

Shao, Feng, 0X

Sherazi, S. M. Y., 0Q

Shi, Xue Long, 0L

Shim, Minyoung, 0V

Shim, Myoungseob, 0V

Shin, Jaepil, 0V

Shin, Tae Hyun, 14

Shin, Youngsoo, 05, 0F

Simiz, J.-G., 0S

Somani, Shikha, 09

Song, Youngsoo, 05

Spanos, Costas J., 0D

St. John, Matt, 16

Staals, F., 0S

Stucchi, Michele, 0N

Su, Xiaojing, 0X

Su, Yajuan, 0X

Sun, Mason, 0Z

Sung, Hyunju, 0V

Sweis, Jason, 08, 09, 0A, 0L, 0Z

Tel, W. T., 0S

Thean, Aaron, 02

Tishchenko, A., 0S

Tokei, Z., 0Q

Trivkovic, D., 0Q

Tsai, Mengfeng, 0A, 0L

Tseng, Shih-En, 07

Tung, Maryann C., 0N

Vandenberghe, Geert, 0N

Verkest, Diederik, 02, 0Q

Wambacq, Piet, 02

Wan, Jinyin, 16

Wandell, Jerome, 12

Wang, Amy, 0A

Wang, Chang Mao, 18

Wang, Jeff, 0Z

Wang, Jessie, 0Z

Wang, JinYan, 0W

Wang, Lynn T.-N., 0B

Wang, Tom, 16

Wang, Wei-Long, 09

Wei, Yayi, 0X

Wilkinson, William, 12

Wong, H.-S. Philip, 0N

Wong, Robert, 06

Woo, Youngtag, 0B

Word, James, 0Y

Wu, Linghui, 16

Xu, Jessy, 0A, 0L

Xu, Xiaoqing, 0M

Yang, Ellyn, 0L

Yang, Hyunjo, 14

Yang, Jae-seok, 0J

Yu, Bei, 0M

Zeng, Jia, 0B

Zhang, ChunLei, 13

Zhang, Recco, 0W, 0X

Zhang, Yifan, 0A, 0L, 0Z

Zhang, Zizhuo, 11

Zhao, Evan, 0Z

Zhou, Jun, 03, 0P, 0T

Zhuang, Lei, 06

Zhuang, Linda, 0A, 0L

Zou, Elain, 0W

Conference Committee

Symposium Chair

  • Mircea V. Dusa, ASML US, Inc. (United States)

Symposium Co-Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Conference Chair

  • Luigi Capodieci, KnotPrime Inc. (United States)

Conference Co-Chair

  • Jason P. Cain, Advanced Micro Devices, Inc. (United States)

Conference Program Committee

  • Robert Aitken, ARM Inc. (United States)

    Fang-Cheng Chang, Cadence Design Systems, Inc. (United States)

    Neal V. Lafferty, Mentor Graphics Corporation (United States)

    Lars W. Liebmann, IBM Corporation (United States)

    Ru-Gun Liu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)

    Mark E. Mason, Texas Instruments Inc. (United States)

    Andrew R. Neureuther, University of California, Berkeley (United States)

    Shigeki Nojima, Toshiba Corporation (Japan)

    David Z. Pan, The University of Texas at Austin (United States)

    Chul-Hong Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

    Michael L. Rieger, Synopsys, Inc. (United States)

    Vivek K. Singh, Intel Corporation (United States)

    Chi-Min Yuan, Freescale Semiconductor, Inc. (United States)

    John L. Sturtevant, Mentor Graphics Corporation (United States)

Session Chairs

  • 1 Layout Optimization and Design Restrictions

    Luigi Capodieci, KnotPrime Inc. (United States)

    Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • 2 Layout Analytics

    David Z. Pan, The University of Texas at Austin (United States)

    Luigi Capodieci, KnotPrime Inc. (United States)

  • 3 Design and Litho Optimization: Joint Session with Conferences 9780 and 9781

    Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • 4 Circuit Modeling

    Chi-Min Yuan, Freescale Semiconductor, Inc. (United States)

    Robert Aitken, ARM Inc. (United States)

  • 5 Hotspot Detection and Removal

    Neal V. Lafferty, Mentor Graphics Corporation (United States)

    Chul-Hong Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • 6 Multiple Patterning and Directed Self-Assembly

    Michael L. Rieger, Synopsys, Inc. (United States)

    Vivek K. Singh, Intel Corporation (United States)

  • 7 Design Interaction with Metrology: Joint Session with Conferences 9778 and 9781

    Alexander Starikov, I&I Consulting (United States)

    Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • 8 Process and Yield Modeling

    Shigeki Nojima, Toshiba Corporation (Japan)

    Fang-Cheng Chang, Cadence Design Systems, Inc. (United States)

© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9781", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978101 (28 June 2016); doi: 10.1117/12.2239765; https://doi.org/10.1117/12.2239765

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