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22 March 2016 Hybrid hotspot detection using regression model and lithography simulation
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As minimum feature sizes shrink, unexpected hotspots appear on wafers. Therefore, it is important to detect and fix these hotspots at design stage to reduce development time and manufacturing cost. Currently, as the most accurate approach, lithography simulation is widely used to detect such hotspots. However, it is known to be time-consuming. This paper proposes a novel aerial image synthesizing method using regression and minimum lithography simulation for only hotspot detection. Experimental results show hotspot detection on the proposed method is equivalent compared with the results on the conventional hotspot detection method which uses only lithography simulation with much less computational cost.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, and David Z. Pan "Hybrid hotspot detection using regression model and lithography simulation", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810C (22 March 2016);

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