This paper will present a novel methodology to enumerate initial test patterns based on other technology node products. With this novel methodology, DRM development and process capability verification can be sped up rapidly in comparison to a more traditional way. At the same time, the process weak-point signatures can be migrated from the older technology nodes to the new technology node for verification. This methodology will help foundries catch process detractor patterns at new technology early development stage.
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Linda Zhuang, Jenny Pang, Jessy Xu, MengFeng Tsai, Xue Long Shi, Qing Wei Liu, Ellyn Yang, Yifan Zhang, Jason Sweis, Ya-Chieh Lai, Hua Ding, "Migrating from older to newer technology nodes and discovering the process weak-points," Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810L (16 March 2016);