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16 March 2016 Verification and application of multi-source focus quantification
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Abstract
The concept of the multi-source focus correlation method was presented in 2015 [1, 2]. A more accurate understanding of real on-product focus can be obtained by gathering information from different sectors: design, scanner short loop monitoring, scanner leveling, on-product focus and topography.

This work will show that chip topography can be predicted from reticle density and perimeter density data, including experimental proof. Different pixel sizes are used to perform the correlation in-line with the minimum resolution, correlation length of CMP effects and the spot size of the scanner level sensor. Potential applications of the topography determination will be evaluated, including optimizing scanner leveling by ignoring non-critical parts of the field, and without the need for time-consuming offline topography measurements.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J.-G. Simiz, T. Hasan, F. Staals, B. Le-Gratiet, W. T. Tel, C. Prentice, J.-W. Gemmink, A. Tishchenko, and Y. Jourlin "Verification and application of multi-source focus quantification", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810S (16 March 2016); https://doi.org/10.1117/12.2219143
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