Hybrid pattern matching based SRAF placement

Ahmed Omran; Andrey Lutich; Uwe Paul Schroeder

doi:10.1117/12.2225830

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16 March 2016 Hybrid pattern matching based SRAF placement

Ahmed Omran, Andrey Lutich, Uwe Paul Schroeder

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Proceedings Volume 9781, Design-Process-Technology Co-optimization for Manufacturability X; 978117 (2016) https://doi.org/10.1117/12.2225830
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

A hybrid multi-step method for Sub-Resolution Assist Feature (SRAF) placement is presented. The process window, characterized by process variation bands (PV-bands), is subjected to optimization. By applying a state-of-the-art advanced pattern matching based approach, the SRAF placement is optimized to maximize the process window. Due to the complexity of building a complete Rule-Based SRAF (RBSRAF) solution and the performance limitation of the Model-Based SRAF solution (MBSRAF), the hybrid pattern based SRAF reduces the complexity and improves performance. In this paper, the hybrid pattern-based SRAF algorithm and its implementation, as well as testing results, are discussed with respect to process window and performance.

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Ahmed Omran, Andrey Lutich, and Uwe Paul Schroeder "Hybrid pattern matching based SRAF placement", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978117 (16 March 2016); https://doi.org/10.1117/12.2225830

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