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16 December 1988 Analysis Of The Smoothing Process Observed During The Soft X-Ray Multilayer Deposition
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Abstract
We have observed that carbon tungsten multilayers smooth substrate surface defects at atomic scale. We have made experiments to understand what is the process responsible of this effect. We have realized silicon tungsten multilayer and carbon single layer to smooth different rough substrate (Li F, frosted Float-Glass). Grazing X-ray reflection (1.54 Å) and soft X-ray reflectivity (44.7 Å) measurements have been used to characterize roughness before and after deposit and in-situ kinetic ellipsometry to understand interfaces formation. Carbon appears to be the determinant factor of the smoothing process.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ph. Houdy, P. Boher, C. Schiller, P. Luzeau, R. Barchewitz, N. Alehyane, and M. Ouahabi "Analysis Of The Smoothing Process Observed During The Soft X-Ray Multilayer Deposition", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948775
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