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16 December 1988 Layered synthetic multilayers for high resolution X-ray reflection in the 6 to 8 keV region.
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Abstract
In this paper results are presented of the deposition and characterization of Ni - C and NiSi - C multilayer coatings consisting of a large number of layers (typically 475; d = 22.3 Å) containing ultra thin metal layers (4 Å). During deposition, information about changes in the roughness of the top interface is obtained using an in situ X-ray reflectometer. Afterwards the coatings have been characterized using CuKα diffraction; the resolutions and relative reflectivities have been determined. The influence of the presence of a hydrogen atmosphere during deposition and the effect of mixing Si with Ni have been studied. Finally we report on a Ni - C multilayer coating consisting of 815 layers, having a resolution λ/Δλ of 275.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E J. Puik, M J van der Wiel, and J. Verhoeven "Layered synthetic multilayers for high resolution X-ray reflection in the 6 to 8 keV region.", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948777
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