1 June 2016 Accurate characterization of mask defects by combination of phase retrieval and deterministic approach
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Abstract
In this paper, we present a method to characterize not only shape but also depth of defects in line and space mask patterns. Features in a mask are too fine for conventional imaging system to resolve them and coherent imaging system providing only the pattern diffracted by the mask are used. Then, phase retrieval methods may be applied, but the accuracy it too low to determine the exact shape of the defect. Deterministic methods have been proposed to characterize accurately the defect, but it requires a reference pattern. We propose to use successively phase retrieval algorithm to retrieve the general shape of the mask and then deterministic approach to characterize precisely the defects detected.
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Min-Chul Park, Min-Chul Park, Thibault Leportier, Thibault Leportier, Wooshik Kim, Wooshik Kim, Jindong Song, Jindong Song, "Accurate characterization of mask defects by combination of phase retrieval and deterministic approach", Proc. SPIE 9867, Three-Dimensional Imaging, Visualization, and Display 2016, 986712 (1 June 2016); doi: 10.1117/12.2224712; https://doi.org/10.1117/12.2224712
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