27 April 2016 Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO2 sol-gel process and colloidal photolithography
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Abstract
The authors demonstrate a low cost direct process to directly print TiO2 grating on both planar and non-conventional substrate such as cylinder components. A well collimated i-line source emitting at a 365nm wavelength illuminates a mono layer of 1μm diameter silica microspheres deposited on a photosensitive TiO2-based sol-gel layer. No etching process is required since this layer is directly UV photo patternable like a negative photo-resist. Furthermore this thin layer offers interesting optical properties (high refractive index) and good mechanical and chemical stability. The paper describes the photochemistry of the TiO2 sol-gel layer process, the modeling of the electric field distribution below the spheres during the illumination process and preliminary results of TiO2 nanopillars of 200 nm diameter.
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L. Berthod, L. Berthod, O. Shavdina, O. Shavdina, F. Vocanson, F. Vocanson, M. Langlet, M. Langlet, O. Dellea, O. Dellea, C. Veillas, C. Veillas, S. Reynaud, S. Reynaud, I. Verrier, I. Verrier, Y. Jourlin, Y. Jourlin, } "Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO2 sol-gel process and colloidal photolithography", Proc. SPIE 9888, Micro-Optics 2016, 988805 (27 April 2016); doi: 10.1117/12.2225917; https://doi.org/10.1117/12.2225917
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