27 April 2016 Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography
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Abstract
Design and fabrication of a high efficiency phase mask have been performed for printing submicron period gratings along 8 mm diameter glass cylinders. In this article, the authors present the radial phase mask specially designed and manufactured for a cylindrical surface micro-structuring under UV photolithography. Its period is sub-micron (480 nm < ΛPM < 720 nm). The authors describe then the phase mask based UV lithography set-up using the interference between the transmitted beams of +1 and -1 orders generated by the phase mask. Preliminary results of printed gratings on a cylinder are described on a sol-gel TiO2 thin film layer, enabling direct photo patterning on functionalized layer. The feasibility of a grating printed with a period of Λcylin = 960 nm on an 8 mm diameter cylinder with this dedicated mask has been demonstrated.
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L. Berthod, L. Berthod, F. Vocanson, F. Vocanson, M. Langlet, M. Langlet, C. Veillas, C. Veillas, S. Reynaud, S. Reynaud, I. Verrier, I. Verrier, J. Laukkanen, J. Laukkanen, O. Parriaux, O. Parriaux, Y. Jourlin, Y. Jourlin, } "Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography", Proc. SPIE 9888, Micro-Optics 2016, 988808 (27 April 2016); doi: 10.1117/12.2227700; https://doi.org/10.1117/12.2227700
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