27 April 2016 Fabrication process of Si microlenses for OCT systems
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Abstract
We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.
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A. Jovic, A. Jovic, G. Pandraud, G. Pandraud, K. Zinoviev, K. Zinoviev, J. L. Rubio, J. L. Rubio, E. Margallo, E. Margallo, P. M. Sarro, P. M. Sarro, "Fabrication process of Si microlenses for OCT systems", Proc. SPIE 9888, Micro-Optics 2016, 98880C (27 April 2016); doi: 10.1117/12.2227898; https://doi.org/10.1117/12.2227898
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