27 April 2016 Fabrication and evaluation of reflective wave plate with subwavelength grating structure
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Abstract
A reflective wave plate with subwavelength grating structure of the photoresist was fabricated using two-beam interference technology, and was then evaluated for phase retardation. Whereas the phase retardation of the transmission wave plate with 400 nm period, fill factor of 0.5, and 240 nm depth, respectively, was 15° at 632.8 nm wavelength, the phase retardation of the fabricated reflective element with 400 nm period, fill factor of 0.5, and 240 nm depth reached 29° for the reason that the optical length of the reflective one became twice as long as the transmissive one because of the use of reflection. By changing the period and depth to 285 nm and to 295 nm, respectively, the phase retardation of a reflective wave plate for 473 nm wavelength achieved 144° at the incident angle of 45°.
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Itsunari Yamada, Itsunari Yamada, "Fabrication and evaluation of reflective wave plate with subwavelength grating structure", Proc. SPIE 9888, Micro-Optics 2016, 98880P (27 April 2016); doi: 10.1117/12.2214800; https://doi.org/10.1117/12.2214800
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