Approaching perfection in the manufacturing of silicon immersion gratings

Benjamin T. Kidder; Cynthia B. Brooks; Michelle M. Grigas; Daniel T. Jaffe

doi:10.1117/12.2233321

22 July 2016 Approaching perfection in the manufacturing of silicon immersion gratings

Benjamin T. Kidder, Cynthia B. Brooks, Michelle M. Grigas, Daniel T. Jaffe

Proceedings Volume 9912, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II; 99123L (2016) https://doi.org/10.1117/12.2233321
Event: SPIE Astronomical Telescopes + Instrumentation, 2016, Edinburgh, United Kingdom

Abstract

Silicon immersion gratings make near-IR spectrographs compact and allow them to have continuous wavelength coverage over a large bandwidth. We have produced an exceptional silicon immersion grating that approaches optical perfection in terms of surface error. This grating has a peak-to-valley error of 79 nm over a 25 mm beam, which exceeds the 85 nm requirement to have λ/4 peak-to-valley error at the shortest wavelength where silicon immersion gratings can be used. In order to reduce the level of large-scale errors we have honed our contact printing method by optimizing our UV exposure system, introducing additional process checks and inspections and carefully evaluating large-scale errors in the gratings produced.

Citation Download Citation

Benjamin T. Kidder, Cynthia B. Brooks, Michelle M. Grigas, and Daniel T. Jaffe "Approaching perfection in the manufacturing of silicon immersion gratings", Proc. SPIE 9912, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II, 99123L (22 July 2016); https://doi.org/10.1117/12.2233321

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