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12 May 2020 Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)
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Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.

Proceedings Volume 9909, Nanophotonic Materials XIII; 99190N (2016)

Online Publication Date: 3 October 2016

Erratum Published: 12 May 2020

A revised version of this manuscript was published on 12 May 2020. Details of the revision are as follows:

Change 1: Table 1, Plasma 2 - gases were listed in the wrong order and so were flipped.

Change 2: Equation 1 - an incorrect negative sign was switched to a positive sign in the denominator of the Lorentz component.

© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lauren M. Otto, Aeron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott Dhuey, Bethanie J. H. Stadler, and Adam M. Schwartzberg "Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)", Proc. SPIE 9919, Nanophotonic Materials XIII, 991918 (12 May 2020);

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