15 September 2016 Fabrication and characterization of one-dimensional multilayer gratings for nanoscale microscope calibration
Author Affiliations +
Abstract
One-dimensional multilayer gratings were prepared by four steps. A periodic Si/SiO2 multilayer was firstly deposited on Si substrate using a magnetron sputtering coating process. Then, the multilayer was been bonded and split into small pieces by diamond wire cutting. The side-wall of the cut sample was subsequently grinded and polished until the surface roughness was less than 1nm. Finally, the SiO2 layers were selective etched using hydrofluoric acid to form the grating structure. In the above steps, special attentions were given to optimize the etching processes to achieve a uniform and smooth grating pattern. Transmission electron microscope (TEM) was used to characterize the multilayer gratings. The pitch size of the grating was evaluated by an offline image analysis algorithm and optimized processes are discussed.
Conference Presentation
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xingrui Wang, Xingrui Wang, Yang Zhao, Yang Zhao, Jie Liu, Jie Liu, Jie Chen, Jie Chen, Tongbao Li, Tongbao Li, Xinbin Cheng, Xinbin Cheng, } "Fabrication and characterization of one-dimensional multilayer gratings for nanoscale microscope calibration", Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99270M (15 September 2016); doi: 10.1117/12.2236866; https://doi.org/10.1117/12.2236866
PROCEEDINGS
7 PAGES + PRESENTATION

SHARE
Back to Top