3 October 2016 Destructive and constructive routes to prepare nanostructures on surfaces by low-energy ion beam sputtering
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Abstract
Various approaches for the preparation of nanostructures with dimension on macroscopic areas are known. In contrast to cost-intensive top-down lithographic techniques, various bottom-up methods based on ion beam technologies to form large arrays of nanostructured surfaces are well established. In principle, it can be distinguished between two routes at the preparation of nanostructures by low-energy ion bombardment sputtering.

The destructive route is characterized that under certain conditions, given by the self-organization processes, the ion beam induced erosion process can lead to the formation of e.g. well-ordered Si nanostructures like dots or ripples on the surface. Using a constructive route, i.e. glancing angle deposition by ion beam sputtering, sculptured thin films consisting of various nanostructures of several shapes, such as inclined and vertical columns, screws, and spirals, were deposited on Si substrates. It will be shown that morphology, shape, and diameter of the structures are influenced and can thus be controlled by adjusting various deposition parameters, including substrate temperature and ratio of substrate rotational speed to film deposition rate.
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Bernd Rauschenbach, Bernd Rauschenbach, Frank Frost, Frank Frost, } "Destructive and constructive routes to prepare nanostructures on surfaces by low-energy ion beam sputtering", Proc. SPIE 9929, Nanostructured Thin Films IX, 99290A (3 October 2016); doi: 10.1117/12.2236472; https://doi.org/10.1117/12.2236472
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