Presentation + Paper
26 September 2016 Characterization of nitrogen doped silicon-carbon multi-layer nanostructures obtained by TVA method
Victor Ciupina, Eugeniu Vasile, Corneliu Porosnicu, Gabriel C. Prodan, Cristian P. Lungu, Rodica Vladoiu, Ionut Jepu, Aurelia Mandes, Virginia Dinca, Aureliana Caraiane, Virginia Nicolescu, Paul Dinca, Agripina Zaharia
Author Affiliations +
Abstract
Ionized nitrogen doped Si-C multi-layer thin films used to increase the oxidation resistance of carbon have been obtained by Thermionic Vacuum Arc (TVA) method. The 100 nm thickness carbon thin films were deposed on silicon or glass substrates and then seven N doped Si-C successively layers on carbon were deposed. To characterize the microstructure, tribological and electrical properties of as prepared N-SiC multi-layer films, Transmission Electron Microscopy (TEM, STEM), Energy Dispersive X-Ray Spectroscopy (EDXS), electrical and tribological techniques were achieved. Samples containing multi-layer N doped Si-C coating on carbon were investigated up to 1000°C. Oxidation protection is based on the reaction between SiC and elemental oxygen, resulting SiO2 and CO2, and also on the reaction involving N, O and Si-C, resulting silicon oxynitride (SiNxOy) with a continuously vary composition, and because nitrogen can acts as a trapping barrier for oxygen. The tribological properties of structures were studied using a tribometer with ball-on-disk configuration from CSM device with sapphire ball. The measurements show that the friction coefficient on the N-SiC is smaller than friction coefficient on uncoated carbon layer. Electrical conductivity at different temperatures was measured in constant current mode. The results confirm the fact that conductivity is greater when nitrogen content is greater. To justify the temperature dependence of conductivity we assume a thermally activated electrical transport mechanism.
Conference Presentation
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Victor Ciupina, Eugeniu Vasile, Corneliu Porosnicu, Gabriel C. Prodan, Cristian P. Lungu, Rodica Vladoiu, Ionut Jepu, Aurelia Mandes, Virginia Dinca, Aureliana Caraiane, Virginia Nicolescu, Paul Dinca, and Agripina Zaharia "Characterization of nitrogen doped silicon-carbon multi-layer nanostructures obtained by TVA method", Proc. SPIE 9929, Nanostructured Thin Films IX, 992910 (26 September 2016); https://doi.org/10.1117/12.2237156
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KEYWORDS
Nitrogen

Silicon

Oxygen

Silicon carbide

Carbon

Coating

Oxidation

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