Presentation
7 November 2016 Memory devices based on self-assembled materials and processes (Conference Presentation)
Author Affiliations +
Abstract
Device fabrication based on top-down approach will reach its limit due to difficulties in patterning and processes below 10 nm node. The bottom-up approach using self-assembled materials and processes can be a viable candidate for further device scaling, but the fabrication processes are mostly not compatible with current device fabrication. In this presentation, device fabrication strategy for next-generation data-storage devices will be discussed in detail based on self-assembled materials and processes. The emphasis is placed on compatibility with current device fabrication strategies. Ordered array of various materials and systems based on bottom-up nanotechnology can be utilized as the charge storage layer for memory devices and the templates for nanoscale device fabrication. Novel device applications, for example, printed/flexible/transparent electronic devices, will be explored based on the self-assembly processes.
Conference Presentation
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jang-Sik Lee "Memory devices based on self-assembled materials and processes (Conference Presentation)", Proc. SPIE 9945, Printed Memory and Circuits II, 994505 (7 November 2016); https://doi.org/10.1117/12.2238596
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KEYWORDS
Materials processing

Nanolithography

Electronic components

Nanotechnology

Optical lithography

Current controlled current source

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