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8 September 2016 Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces
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Low-roughness ultrasmooth surfaces are under increasing demand in short-wavelength optical systems. Substitching interferometry has been used to measure the profiles of surfaces used in X-ray beam. To validate the stitching accuracy of our optical profiler, a comparison of stitching surfaces using a 10X objective and those directly measured using a 2.5X objective is performed with a resolution of 1 μm. By studying the multiple measurements and defocussing errors, the reference surface error is measured in various regions of a standard flat surface with random positions and rotation angles. In the final experiment, 25 subapertures measured using a 10X objective with reduced reference surface error are stitched to a 2.54 X 1.90 mm area. The comparison is between the stitching and the same area measured directly using the 2.5X objective, and the results show that a root-mean-square accuracy of <0.2 nm can be achieved.
Conference Presentation
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xudong Xu, Qiushi Huang, Zhengxiang Shen, and Zhanshan Wang "Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces", Proc. SPIE 9962, Advances in Metrology for X-Ray and EUV Optics VI, 996208 (8 September 2016);

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