Translator Disclaimer
17 October 2016 Characterizing environmental effects on visible and UV reflectance of ALD-coated optics
Author Affiliations +
Numerous atomic and molecular transitions that provide important diagnostics for astrophysical research exist in the Lyman-ultraviolet (LUV; 91.2 - 121.6 nm) and far-ultraviolet (FUV; 121.6 - 200 nm) bandpasses. Future astronomy and planetary science missions require the development of mirror coatings with improved reflectance between 90 - 200 nm which maintain optical performance in visible and IR wavelengths (320 - 2000 nm). Towards this end, we have developed an atomic layer deposition (ALD) process for optical coatings to enhance the efficiency of future space observatories. We measured the reflectance from 115-826 nm of sample optics, consisting of silicon wafers coated with lithium fluoride films deposited via ALD. We also measured the reflectance of sample optics stored in various environments, and characterized the effect of storage environment on visible and UV optical performance over week-long time scales. Minimal change in optical performance was observed for wavelengths between 200 and 800 nm, regardless of storage environment.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Carter, Christopher Samuel Moore, John Hennessy, April D. Jewell, Shouleh Nikzad, and Kevin France "Characterizing environmental effects on visible and UV reflectance of ALD-coated optics", Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630V (17 October 2016);

Back to Top