Creation of economical and robust large area MCPs by ALD method for photodetectors

Anil U. Mane; Jeffrey W. Elam; Robert G. Wagner; Oswald H. W. Siegmund; Michael J. Minot

doi:10.1117/12.2237865

30 September 2016 Creation of economical and robust large area MCPs by ALD method for photodetectors

Anil U. Mane, Jeffrey W. Elam, Robert G. Wagner, Oswald H. W. Siegmund, Michael J. Minot

Proceedings Volume 9968, Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XVIII; 99680C (2016) https://doi.org/10.1117/12.2237865
Event: SPIE Optical Engineering + Applications, 2016, San Diego, California, United States

Abstract

We report a cost-effective and production achievable path to fabricate robust large-area microchannel plates (MCPs), which offers the new prospect for larger area MCP-based detector technologies. We used atomic Layer Deposition (ALD), a thin film growth technique, to independently adjust the desired electrical resistance and secondary electron emission (SEE) properties of low cost borosilicate glass micro-capillary arrays (MCAs). These capabilities allow a separation of the substrate material properties from the signal amplification properties. This methodology enables the functionalization of microporous, highly insulating MCA substrates to produce sturdy, large format MCPs with unique properties such as high gain (<107/MCP pair), low background noise, ~10ps time resolution, sub-micron spatial resolution and excellent stability after only a short (2-3days) scrubbing time. The ALD self-limiting growth mechanism allows atomic level control over the thickness and composition of resistive and secondary electron emission (SEE) layers that can be deposited conformally on high aspect ratio (~100) capillary glass arrays. We have developed several robust and consistent production doable ALD processes for the resistive coatings and SEE layers to give us precise control over the MCP parameters. Further, the adjustment of MCPs resistance by tailoring the ALD material composition permits the use of these MCPs at high or low temperature detector applications. Here we discuss ALD method for MCP functionalization and a variety of MCP testing results.

Conference Presentation

Citation Download Citation

Anil U. Mane, Jeffrey W. Elam, Robert G. Wagner, Oswald H. W. Siegmund, and Michael J. Minot "Creation of economical and robust large area MCPs by ALD method for photodetectors", Proc. SPIE 9968, Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XVIII, 99680C (30 September 2016); https://doi.org/10.1117/12.2237865

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