Translator Disclaimer
16 December 1988 A Deep UV Imaging System For Lithography And Process Development
Author Affiliations +
Proceedings Volume 0998, Excimer Beam Applications; (1988)
Event: O-E/Fiber LASE '88, 1988, Boston, MA, United States
A simple optical imaging system has been designed and built for printing sub-half-micron lithographic images at 248 nm. The following discusses the design considerations of producing a system that can achieve the optical and mechanical criteria of microlithography while still maintaining the simplicity and versatility for a research and development instrument. Also, discussed are designs of lenses that perform at other UV wavelengths and mount in the same mechanical system as the 248 nm lens.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul Michaloski and Paul Dewa "A Deep UV Imaging System For Lithography And Process Development", Proc. SPIE 0998, Excimer Beam Applications, (16 December 1988);


0.35-micron excimer DUV photolithography process
Proceedings of SPIE (August 07 1993)
Performance Of A KrF Excimer Laser Stepper
Proceedings of SPIE (December 31 1987)
Further improvements in CGR formulation and process
Proceedings of SPIE (May 15 1994)
Deep UV Lithography: Problems And Potential
Proceedings of SPIE (August 31 1987)

Back to Top