7 September 2016 Front Matter: Volume 9984
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume PMJ, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.
Yoshioka: Front Matter: Volume 9984

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Author(s), “Title of Paper,” in Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, edited by Nobuyuki Yoshioka, Proceedings of SPIE Vol. 9984 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510603721

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Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Adachi, Takashi, 04

Amano, Tsuyoshi, 0M

Anderson, Christopher N., 0P

Ando, Toshiaki, 0U

Asada, Hironori, 0L

Babin, Sergey, 06

Badger, Karen, 02

Bagge, Patrick, 0G

Ballman, Katherine, 0S

Bean, Alexander, 0S

Bender, Markus, 0N

Beschorner, Klaus, 0U

Borisov, Sergey, 06

Bowhill, Amanda, 0D

Buck, Peter, 0C

Bürgel, Christian, 03

Chalvin, Florian, 0K

Chao, Weilun, 0P

Chen, Chia-Jen, 08

Chen, Chien-Cheng, 08

Chen, Hsuan-Chen, 08

Chen, Yulu, 0G

Choi, Jae-Keun, 0F

Choi, Junyoul, 0W

Choi, Seuk Hwan, 07

Chung, Dong Hoon, 07

Deep, Prakash, 0C

Deng, Erwin, 0D

Deutz, Alex, 0R

Dietze, Uwe, 0U

Dunn, Thomas, 0S

Faure, Thomas, 02

Feicke, Axel, 03

Fujimura, Aki, 0B

Fujimura, Yukihiro, 04

Fukugami, Norihito, 0O

Garetto, Anthony, 09

Goldberg, Kenneth A., 0P

Gullikson, Eric, 0P

Hagihara, Kazuki, 0T

Han, Hak Seung, 07

Han, Yoon Taek, 07

Haraguchi, Takashi, 0O

Hatakeyama, Masahiro, 0M

Hattori, Kiyoshi, 05

Hay, Derrick, 0G

Hayano, Katsuya, 04

Hayashi, Naoya, 0E, 0V

Herrmann, Mark, 03

Hirai, Yoshihiko, 0K

Hirano, Ryoichi, 0M

Hirose, Satoru, 05

Horiuchi, Toshiyuki, 0H, 0I, 0J

Hoshino, Ryoichi, 0L

Hu, Lin, 02

Huang, Cheng-Hsuan, 08

Hwang, Seolchong, 09

Hwang, Sollee, 0F

Iida, Noriko, 0E

Iida, Susumu, 0M

Inazuki, Yukio, 02, 04

Inoue, Hideo, 05

Ishida, Hiroyuki, 0U

Ishida, Shingo, 0U

Isogawa, Takeshi, 02

Ito, Kaiki, 0I

Ito, Shin, 0O

Ito, Yoshiyasu, 0V

Itoh, Masamitsu, 0T, 0V

Jang, Heeyeon, 09

Jeon, Chan-Uk, 07, 0W

Kadota, Kazuya, 0A

Kagawa, Masayuki, 02, 0Q

Kamo, Takashi, 0E

Kanamitsu, Shingo, 0T

Katada, Osamu, 0U

Kawai, Yoshio, 04

Kawanobe, Yoshio, 0U

Kawata, Atsushi, 0L

Kawata, Hiroaki, 0K

Khaw, Ian, 0G

Kim, Byung Gook, 0W

Kim, Dai-Gyoung, 0F

Kim, Jung-Jin, 0W

Kim, Min-Ha, 0F

Kim, Minho, 0W

Kim, Ryoung-han, 0G

Kim, Sangpyo, 09

Kishimura, Yukiko, 0L

Kobayashi, Noa, 0H

Kodera, Yutaka, 0O

Koh, Soowan, 0W

Komagata, Tadashi, 06

Komizo, Toru, 0O

Konishi, Toshio, 0O

Koster, Norbert, 0R

Kotani, Jun, 0O

Lawliss, Mark, 02

Lee, Christopher, 0S

Lee, Gaston, 08

Lee, Han-Shin, 0W

Lee, Hsin-Chang, 08

Lee, Hyung-Joo, 07

Lee, Jiyoung, 0W

Lee, Rachel, 0D

Lee, Youngmo, 09

Liao, Hung-Yueh, 0D

Lien, Ta-Cheng, 08

Lin, Ling-Chieh, 0D

Lin, Ren-Hao, 08

Lin, Roger, 0D

Lobb, Granger, 02

Ma, Shou-Yuan, 0D

Maruyama, Shingo, 0O

Matsumoto, Hiroshi, 05

Matsumoto, Jun, 07

Militsin, Vladimir, 06

Miyashita, Hiroyuki, 04

Molkenboer, Freek, 0R

Morikawa, Yasutaka, 04, 0E

Morita, Hirofumi, 05

Motokawa, Takeharu, 0T

Murakami, Takeshi, 0M

Nakamura, Naoto, 0K

Nakamura, Takayuki, 07

Narita, Eisuke, 0Q

Naulleau, Patrick, 0P

Nesládek, Pavel, 0N

Nishikawa, Kazuhiro, 02

Ochiai, Shunsuke, 0L

Ogasawara, Munehiro, 05

Ogata, Kiyoshi, 0V

Ogiso, Yoshiaki, 07

Oh, Hye-Keun, 0F

Omote, Kazuhiko, 0V

Paninjath, Sankaranarayanan, 0C

Park, Eun-Sang, 0F

Park, Won Joo, 07

Pereira, Mark, 0C

Qi, Zhengqing John, 0G, 0Q

Rankin, Jed, 0Q

Russell, Gordon, 0D

Sagara, Tomoya, 0J

Saito, Masato, 0T

Sakamoto, Yoshifumi, 02

Salmassi, Farhad, 0P

Sasaki, Ryunosuke, 0H

Schedel, Thorsten, 0N

Schmädicke, Cindy, 03

Schulz, Kristian, 09

Seki, Kazunori, 02

Shamsi, Zahid Hussain, 0F

Shi, Zhimin, 0G

Shida, Soichi, 07

Suematsu, Kenichi, 0M

Suenaga, Machiko, 0T

Sun, Lei, 0G

Suzuki, Yuta, 0I

Takahashi, Hiroshi, 0J

Takai, Kosuke, 0E

Takayama, Tomohiro, 0L

Tanabe, Mana, 0T

Tani, Ayako, 04

Taniguchi, Rikiya, 0V

te Sligte, Edwin, 0R

Terao, Kenji, 0M

Tochino, Takamitsu, 0K

Toda, Yusuke, 02

Tsai, Jenny, 0D

Tsai, Joe, 0D

Ueno, Takehiko, 0U

Viswanathan, Ramya, 02

Vu, Hien, 0D

Wakatsuki, Tetsuro, 06

Wang, Alice, 0D

Watanabe, Genta, 0O

Watanabe, Hidehiro, 0M

Willis, Jan, 0B

Wistrom, Richard, 02

Wojdyla, Antoine, 0P

Woo, Sungha, 09

Wood, Obert, 0G

Xu, Yongan, 02

Yagawa, Keisuke, 0T

Yamada, Hirokazu, 05

Yamanaka, Eiji, 0V

Yamashita, Hiroshi, 05

Yang, Chuen-Huei, 0D

Yang, Hyunjo, 09

Yasuda, Masaaki, 0K

Yen, Anthony, 08

Yoshida, Itaru, 0O

Zweber, Amy, 02

Conference Committee

Symposium Chair

  • Toshiyuki Horiuchi, Tokyo Denki University (Japan)

Symposium Vice Chair

  • Masato Shibuya, Tokyo Polytechnic University (Japan)

Advisory Committee Chair

  • Masanori Komuro, High Energy Accelerator Research Organization (Japan)

Advisory Committee

  • Morihisa Hoga, Dai Nippon Printing Company, Ltd. (Japan)

  • Masao Otaki, Consultant (Japan)

  • Tadahiro Takigawa, ALITECS Corporation (Japan)

  • Yoshio Tanaka, D2S, Inc. (United States) and K.K. D2S (Japan)

Organizing Committee Chair

  • Toshiyuki Horiuchi, Tokyo Denki University (Japan)

Organizing Committee Vice Chair

  • Masato Shibuya, Tokyo Polytechnic University (Japan)

Organizing Committee

  • Uwe Behringer, UBC Microelectronics (Germany)

    Parkson Chen, Taiwan Mask Corporation (Taiwan)

    Junko Collins, SEMI Japan (Japan)

    Brian J. Grenon, RAVE, LLC (United States)

    Hideaki Hamada, HTL Company Japan Ltd. (Japan)

    Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

    Eiichi Hoshino, Nikon Corporation (Japan)

    Kunihiro Hosono, Renesas System Design Company, Ltd. (Japan)

    Koji Mikami, Canon Inc. (Japan)

    Hideaki Mitsui, HOYA Corporation (Japan)

    Junji Miyazaki, ASML Japan Company, Ltd. (Japan)

    Warren Montgomery, Colleges of Nanoscale Science and Engineering (United States)

    Ichiro Mori, EUVL Infrastructure Development Center, Inc. (Japan)

    Yoshinori Ouchi, Hitachi High-Tech Science Corporation (Japan)

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Auditors

  • Takehiko Gunji, Sony Semiconductor Corporation (Japan)

  • Yoji Tonooka, Toppan Printing Company, Ltd. (Japan)

Steering Committee Chair

  • Kunihiro Hosono, Renesas System Design Company, Ltd. (Japan)

Steering Committee Vice Chairs

  • Toshio Konishi, Toppan Printing Company, Ltd. (Japan)

  • Hidehiro Watanabe, EUVL Infrastructure Development Center, Inc. (Japan)

Steering Committee

  • Takayuki Abe, NuFlare Technology Inc. (Japan)

    Akihiko Ando, Toshiba Corporation (Japan)

    Naoyuki Ishiwata, FUJITSU Semiconductor Ltd. (Japan)

    Takashi Kamo, Toshiba Corporation (Japan)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

    Yasutaka Morikawa, Dai Nippon Printing Company, Ltd. (Japan)

    Hiroaki Morimoto, Toppan Printing Company, Ltd. (Japan)

    Naoki Nishida, HOYA Corporation (Japan)

    Teruaki Noguchi, JEOL Ltd. (Japan)

    Kiwamu Takehisa, Lasertec Corporation (Japan)

    Hiroyoshi Tanabe, Intel K.K. (Japan)

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Program Committee Chair

  • Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Program Committee Vice Chairs

  • Akihiko Ando, Toshiba Corporation (Japan)

  • Kiwamu Takehisa, Lasertec Corporation (Japan)

Program Committee

  • Tsukasa Abe, Dai Nippon Printing Company, Ltd. (Japan)

    Hajime Aoyama, Nikon Corporation (Japan)

    Peter Buck, Mentor Graphics Corporation (United States)

    Jeff Farnsworth, Intel Corporation (United States)

    Thomas Faure, GLOBALFOUNDRIES Corporation (United States)

    Kazuyuki Hagiwara, K.K. D2S (Japan)

    Hidemichi Imai, Dai Nippon Printing Company, Ltd. (Japan)

    Ichiro Kagami, Sony Semiconductor Corporation (Japan)

    Franklin Kalk, Toppan Photomasks. Inc. (United States)

    Takashi Kamikubo, NuFlare Technology, Inc. (Japan)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

    Byung-Gook Kim, Samsung Electronics Company, Ltd. (Korea, Republic of)

    Yutaka Kodera, Toppan Printing Company, Ltd. (Japan)

    Yasushi Kojima, Renesas System Design Company, Ltd. (Japan)

    Jun Kotani, Toppan Printing Company, Ltd. (Japan)

    Yasuyuki Kushida, FUJITSU Semiconductor Ltd. (Japan)

    John Lin, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

    Mark Ma, Photronics, Inc. (United States)

    Hironobu Manabe, JEOL Ltd. (Japan)

    Junji Miyazaki, ASML Japan Company, Ltd. (Japan)

    Yoshinori Nagaoka, KLA-Tencor Japan Ltd. (Japan)

    Tsutomu Shoki, HOYA Corporation (Japan)

    Yasunari Sohda, Hitachi, Ltd. (Japan)

    Yasuko Tabata, TowerJazz Panasonic Semiconductor Company, Ltd. (Japan)

    Nobuhiko Yabu, Canon Inc. (Japan)

    Tetsuya Yamamoto, KLA-Tencor Corporation (United States)

Session Chairs

  • 1 FPD Photomasks

    Ichiro Kagami, Sony Semiconductor Corporation (Japan)

    Nobuhiko Yabu, Canon Inc. (Japan)

  • 2 Opening Session

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

  • 3 Repair

    Akihiko Ando, Toshiba Corporation (Japan)

    Yasushi Kojima, Renesas System Design Company, Ltd. (Japan)

  • 4 Photomask Fabrication Processes

    Jun Kotani, Toppan Printing Company, Ltd. (Japan)

    Hironobu Manabe, JEOL Ltd. (Japan)

  • 5 Writing Technologies

    Uwe Behringer, UBC Microelectronics (Germany)

    Takashi Kamikubo, NuFlare Technology, Inc. (Japan)

  • 6 Metrology

    Klaus-Dieter Roeth, KLA Tencor MIE-Germany (Germany)

    Kiwamu Takehisa, Lasertec Corporation (Japan)

  • 7 EDA, MDP & Lithography

    Peter Buck, Mentor Graphics Corporation (United States)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

  • 9 EUVL Masks I

    Thomas Faure, GLOBALFOUNDRIS Corporation (United States)

    Tsukasa Abe, Dai Nippon Printing Company, Ltd. (Japan)

  • 10 EUVL Masks II

    Jeff Farnsworth, Intel Corporation (United States)

    Tsutomu Shoki, HOYA Corporation (Japan)

  • 11 EUVL Masks III

    Bryan S. Kasprowicz, Photronics, Inc. (United States)

    Yutaka Kodera, Toppan Printing Company, Ltd. (Japan)

© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9984", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998401 (7 September 2016); doi: 10.1117/12.2243034; https://doi.org/10.1117/12.2243034
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