20 May 2016 Formation mechanism of the photomask blanks material related haze
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Abstract
We have observed a new type haze of which formation deviates from the generally accepted models with respect to the size, shape, and removability by chemicals. It has very small size of 50~100nm and are crowded around the cell boundary, while the typical haze doesn’t prefer a special region on mask in the majority of cases. It is hard to remove by general cleaning, while the typical haze is easily removed by general cleaning process and even de-ionized water. It is confirmed that the source of the haze is blank material related ions which are formed by chemical etching of blanks during mask cleaning process or the photomask blanks itself.
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Jung-Jin Kim, Jung-Jin Kim, Junyoul Choi, Junyoul Choi, Soowan Koh, Soowan Koh, Minho Kim, Minho Kim, Jiyoung Lee, Jiyoung Lee, Han-Shin Lee, Han-Shin Lee, Byung Gook Kim, Byung Gook Kim, Chan-uk Jeon, Chan-uk Jeon, } "Formation mechanism of the photomask blanks material related haze", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 99840W (20 May 2016); doi: 10.1117/12.2246678; https://doi.org/10.1117/12.2246678
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