The world’s first high throughput multi-beam mask writers (MBMW) have been realized by upgrading the existing MBMW Alpha and Beta tools with a 10x faster data path. In these tools a multi-beam column provides 262-thousand programmable beams of 20nm beam size. The current density is adjustable up to 1 A/cm2, resulting in a total beam current of up to 1 μA. With the upgraded 120 Gbps data path full field 7nm node layouts can be printed in less than 10 hours. This upgrade completes IMS’ first generation of multi-beam mask writers, which is called MBMW-101 and is meeting the requirements of the 7nm technology node.