NXE pellicle: development update

Derk Brouns; Aage Bendiksen; Par Broman; Eric Casimiri; Paul Colsters; Dennis de Graaf; Hilary Harrold; Piet Hennus; Paul Janssen; Ronald Kramer; Matthias Kruizinga; Henk Kuntzel; Raymond Lafarre; Andrea Mancuso; David Ockwell; Daniel Smith; David van de Weg; Jim Wiley

doi:10.1117/12.2239882

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26 September 2016 NXE pellicle: development update

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, Jim Wiley

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Proceedings Volume 9985, Photomask Technology 2016; 99850A (2016) https://doi.org/10.1117/12.2239882
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

ASML introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. We will present results of how we have taken the idea from concept to a demonstrated solution enabling the use of EUV pellicle by the industry for high volume manufacturing. We will update on the development of the next generation of pellicle films with higher power capability. Further, we will provide an update on top level requirements for pellicles and external interface requirements needed to support NXE pellicle adoption at a mask shop. Finally, we will present ASML’s pellicle handling equipment to enable pellicle use at mask shops and our NXE pellicle roadmap outlining future improvements.

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Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, and Jim Wiley "NXE pellicle: development update", Proc. SPIE 9985, Photomask Technology 2016, 99850A (26 September 2016); https://doi.org/10.1117/12.2239882

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