NXE pellicle: development update

Derk Brouns; Aage Bendiksen; Par Broman; Eric Casimiri; Paul Colsters; Dennis de Graaf; Hilary Harrold; Piet Hennus; Paul Janssen; Ronald Kramer; Matthias Kruizinga; Henk Kuntzel; Raymond Lafarre; Andrea Mancuso; David Ockwell; Daniel Smith; David van de Weg; Jim Wiley

doi:10.1117/12.2239882

26 September 2016 NXE pellicle: development update

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, Jim Wiley

Author Affiliations +

Proceedings Volume 9985, Photomask Technology 2016; 99850A (2016) https://doi.org/10.1117/12.2239882
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

ASML introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. We will present results of how we have taken the idea from concept to a demonstrated solution enabling the use of EUV pellicle by the industry for high volume manufacturing. We will update on the development of the next generation of pellicle films with higher power capability. Further, we will provide an update on top level requirements for pellicles and external interface requirements needed to support NXE pellicle adoption at a mask shop. Finally, we will present ASML’s pellicle handling equipment to enable pellicle use at mask shops and our NXE pellicle roadmap outlining future improvements.

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Derk Brouns, Derk Brouns, Aage Bendiksen, Aage Bendiksen, Par Broman, Par Broman, Eric Casimiri, Eric Casimiri, Paul Colsters, Paul Colsters, Dennis de Graaf, Dennis de Graaf, Hilary Harrold, Hilary Harrold, Piet Hennus, Piet Hennus, Paul Janssen, Paul Janssen, Ronald Kramer, Ronald Kramer, Matthias Kruizinga, Matthias Kruizinga, Henk Kuntzel, Henk Kuntzel, Raymond Lafarre, Raymond Lafarre, Andrea Mancuso, Andrea Mancuso, David Ockwell, David Ockwell, Daniel Smith, Daniel Smith, David van de Weg, David van de Weg, Jim Wiley, Jim Wiley, "NXE pellicle: development update", Proc. SPIE 9985, Photomask Technology 2016, 99850A (26 September 2016); doi: 10.1117/12.2239882; https://doi.org/10.1117/12.2239882

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