Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)

Noriyuki Harashima; Hiroyuki Iso; Tatsuya Chishima

doi:10.1117/12.2241378

4 October 2016 Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 9985, Photomask Technology 2016; 99851H (2016) https://doi.org/10.1117/12.2241378
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed prototyping 9-inch size PSM KrF and ArF mask blanks. This time we will explain these PSM mask blanks status.

Citation Download Citation

Noriyuki Harashima, Hiroyuki Iso, and Tatsuya Chishima "Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)", Proc. SPIE 9985, Photomask Technology 2016, 99851H (4 October 2016); https://doi.org/10.1117/12.2241378

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