4 October 2016 Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)
Author Affiliations +
Abstract
6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed prototyping 9-inch size PSM KrF and ArF mask blanks. This time we will explain these PSM mask blanks status.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Noriyuki Harashima, Noriyuki Harashima, Hiroyuki Iso, Hiroyuki Iso, Tatsuya Chishima, Tatsuya Chishima, } "Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)", Proc. SPIE 9985, Photomask Technology 2016, 99851H (4 October 2016); doi: 10.1117/12.2241378; https://doi.org/10.1117/12.2241378
PROCEEDINGS
4 PAGES


SHARE
RELATED CONTENT

New grade of 9 inch size mask blanks for 450mm...
Proceedings of SPIE (October 08 2014)
New grade of 9 inch size mask blanks for 450mm...
Proceedings of SPIE (November 11 2015)
Quartz 9 inch size mask blanks for ArF PSM (Phase...
Proceedings of SPIE (July 13 2017)
Thick SU-8 photolithography for BioMEMS
Proceedings of SPIE (January 15 2003)
The MEEF NILS divergence for low k1 lithography
Proceedings of SPIE (October 30 2007)

Back to Top