Correction of deflection under mask’s own weight by bending mask technology

Takashi Yagami; Takashi Kambayashi; Minako Azumi

doi:10.1117/12.2241153

5 October 2016 Correction of deflection under mask’s own weight by bending mask technology

Takashi Yagami, Takashi Kambayashi, Minako Azumi

Proceedings Volume 9985, Photomask Technology 2016; 99851X (2016) https://doi.org/10.1117/12.2241153
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

It is known that the photomask substrate deflects when the mask is set on the frame and the deflection is an obstacle to light exposure. In this study, we introduce “the bending mask” to cancel out the deflection. The surface of the bending mask has the height distribution in advance to cancel out the deflection, owing to Nikon’s accurate polishing technology and Nikon’s accurate measurement machine.

Citation Download Citation

Takashi Yagami, Takashi Kambayashi, and Minako Azumi "Correction of deflection under mask’s own weight by bending mask technology", Proc. SPIE 9985, Photomask Technology 2016, 99851X (5 October 2016); https://doi.org/10.1117/12.2241153

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